K. Stępniak; F. Akhtar; K. Jasiewicz; N. Levintant-Zayonts; A. Królicka; D.M. Jarząbek
Journal of Materials Research and Technology 41 (2026) 757-770
This study examines nitrogen ion implantation’s effects on the microstructure, mechanical behavior, and
tribological performance of an octonary high-entropy thin film metallic glass HfMoNbTaTiVWZr. Ion implan
tation led to binary nitride formation, elemental redistribution, and surface modifications while maintaining
significant degree of amorphization, what indicates local atomic rearrangement rather than crystallization.
Structural and chemical analyses using TEM, XRD, and EDS mapping revealed phase stability changes and
preferential segregation of heavy elements like hafnium and tantalum at high doses. Hardness enhancement was
attributed to solid solution strengthening, fine nitride formation, increased lattice distortion, residual stress, and
densification. At an optimal implantation dose (1e17 ions/cm2), hardness increased to 20 GPa, reducing the
coefficient of friction and improving wear resistance. A comparison with a magnetron-sputtered (HfMoNbTa
TiVWZr)N thin film showed distinct hardness-depth profiles, confirming localized strengthening effects. These
findings highlight nitrogen implantation as an effective surface engineering technique for optimizing material
performance in demanding applications.